PVD equipment
This is a hybrid deposition system based on three physical deposition methods, equipped with four sputtering guns for magnetron sputtering, two electron beam deposition guns for EB deposition, and a K-cell for MBE. Added a facing targets sputtering unit, it also supports magnetic materials, which is usually said difficult to deposit along with high melting point materials and metal oxides. With the multi ports of lower flange on which MBE source can be attached, for example, this system holds a versatile multi chamber that offers various combinations of PVD methods such as RHEED and laser beam unit, and would serve for a long time as an apparatus that doesn't depend on your research themes.
| Vacuum range |
≦1.0E-7Pa |
| Substrate size |
2 inches |
| Substrate temperature |
Max.1000℃ |
| Sample transfer |
Transfer rod |
- Ultra-high vacuum chamber with 300mmφ (with LN2 shroud)
- Transferring chamber
- EB guns x 2
- 2 inch sputtering source x 2
- K-Cell x 2
- 4 axis manipulator with heating unit
- TMP & SP pumping unit
- RHEED with 3 inch monitor screen
| Estimate |
| Hybrid PDV System |
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* Our company can design and provide the system according to the customers' specifications. For details, click here to contact us.
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