CVD is a kind of thin film deposition method, in which gaseous source materials (originally gas, liquid, and solid) are introduced into a reacting chamber, then reacts while being gas state or after reached onto the substrate's surface, and are deposited as a solid film on the substrate. As the means for exciting the gaseous source materials, heat, plasma, rays including laser and UV-light etc. are usually used, and we provide the apparatus for corresponding methods: heat CVD, plasma CVD and light CVD and so on.
Tokyo Institute of Technology, National Institute for Materials Science,
|CVD: Chemical Vapor Deposition System
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