Electron beam deposition equipment
This system is a deposition system for high melting point metals using electron beam heating.
In order to achieve higher utilization rate of the materials and better property of the membrane, this system uses a rotation and revolution type planetary mechanism. With the electron beam gun of maximum 30kW power and high volume crucibles, even the films thicker than several hundred microns can be deposited rapidly. Our technology enabled accurate thickness and rate measurement on high speed deposition with an accurate quartz monitor.
| Vacuum rage |
≦1.0E-5Pa |
| Electron beam gun |
Maximum power 30kW (15kV, 2A) |
| Substrate heating |
Maximum 450℃ |
| Planetary |
Rotates and revolves during deposition for high uniformity |
| Controller |
PLC for process sequence from automated pumping to automated start-up of deposition |
- 800mmφdiameter high vacuum chamber
- Electron beam gun
- DP & RP pumping
- Cryo-cooling
- Chiller with circulating water
- System controller panel
High frequency speaker corn manufacturing
| Estimate |
| Electron beam deposition system |
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* Our company can design and provide the system according to the customers' specifications. For details, click here to contact us.
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