Analysis, observation, assessment apparatus
This apparatus is a kind of high resolution confocal microscope that enables observation of the material surface topology in high vacuum. By connecting the deposition chamber to the observation chamber, it will also be possible to observe the surface without exposing the sample to the atmosphere just after depositing the material. This microscope can form 3-dimensionnal images due to the great depth of focus, and the space resolution reaches 0.3μm.
* This apparatus was commercialized under the mentorship of Prof. Yuji Matsumoto (Tokyo Institute of Technology).
Matsumoto Lab.
Materials and Structures Laboratory and Department of Innovative & Engineered Materials, Tokyo Institute of Technology
URL: http://www.msl.titech.ac.jp/~matsumoto/index.html
Ultimate vacuum |
≦1.0E-6Pa |
Sample size |
10mm |
Magnification |
250〜1250× |
Visual field |
1150〜230μm |
Substrate heating temperature |
Max500℃ |
Inlet gas-line |
1 line (mix. gas) |
- Laser scanning microscope
- UHV chamber with water jacket cooling
- Pumping system with TMP and RP
- Sample manipulating stage with heating function
- Gas mixing control panel (1 output with 2 inlet gas inputs)
Estimate |
UHV Laser Microscope |
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* Our company can design and provide the system according to the customers' specifications. For details, click here to contact us.
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